Single Wafer ALD for TiN (IPMS-MRS05.1) - PR896468-2480-P

1 piece Single Wafer ALD for TiN

A single wafer atomic layer deposition system for TiN as well as for Al2O3 and SiO2 is adressed. The system has to be featured with a remote plasma source either for TiN process or prepearing the surface directly before ALD. This system is necessary for two major process line applications. One application is the deposition of a TiN barrier inside of TSV for the advanced integration of MEMS chiplets. The second application scenario is the Via or frontside TSV liner/barrier deposition for QMI (quasi monolithic integration) metallization systems. In both applications the conformal deposition of the barrier is necessary to achieve best contact quality. It is curcial that only the front side of a wafer is deposited by the film. Additionally the system needs to be capable to provide state-of-the-art dielectric films such as Al2O3 and SiO2. Such system has to be integrated directly into the advanced QMI integration line to prevent contamination, hence mechanical defects and contamination topics are crucial. The system will be installed in a normal cleanroom support structure.

optional service items: 02.02 Hardware Requirements "Single Wafer or Batch chamber with SiO2 and Al2O3 ALD separated from TiN process chamber " yes / no 04.06 Cassette / Wafer specifications Processing of quartz wafer according to above mentioned specs yes / no 08.01 Process System All pressure gauge connections are equipped with an isolation valve to allow swapping w/o the need to vent the chamber yes / no 09.01.01 Process Specification - general System for layer growth control (Quartz cristal microbalance, reflectometer, ellipsometer or similar) yes / no 12.06 Extended Warranty Please offer an extended warranty of further 24-months yes / no 13.01 Optional Atomic layer etch process for adressed material systems in same process chambers yes / no 13.02 Optional In situ optical monitoring (e.g. ellipsometry) for process control feedback yes / no 13.03 Optinal Set of consumable parts (chamber insets, o-rings, valves, etc.) to cover the warranty period yes / no