Plasma oxidation module (200mm, CMOS) for mounting vapor deposition cluster tool - PR847550-2270-W

1 plasma oxidation module (200mm, CMOS) for attachment to the vapor deposition cluster tool The plasma oxidation module, attached to a free port of the vapor deposition cluster, enables the precise generation of thin oxide layers (e.g. on Si or Al). The oxidation is plasma-assisted and therefore allows the use of low process temperatures, which is essential for the oxidation of aluminum, for example. Among other things, the production of very thin (<10nm) and dense aluminum oxide layers is intended to ensure the quality and reproducibility of tunnel structures in quantum devices. In combination with the vapor deposition cluster, quantum structures can be produced without breaking the vacuum and thus exposing the samples to natural oxidation. Options:

6.3 As an option, a spare parts kit shall be offered according to standard spare parts lists (weekly, monthly, quarterly/semi-annually, annually) for 24/7 operation. The kit should contain all typical spare parts to ensure smooth operation of the system over a period of 24 months 6.4 As an option, a warranty extension of 12 additional months is to be offered 6.8 Additional training courses for operators and process engineers (for at least 3 persons) should be offered as an option 7.5 A separate pre-installation box for all media (vacuum, water, air cooling, exhaust gas, Ethernet, gases, etc.) is to be offered as an option. A compact support center